new material
Tantalum Disilicide (TaSi₂) is a high-performance intermetallic compound composed of tantalum and silicon. It is known for its exceptional thermal stability, oxidation resistance, and electrical conductivity, making it ideal for high-temperature coatings, semiconductor applications, and advanced ceramic materials. With a melting point of approximately 2,200°C, TaSi₂ is widely used in aerospace, electronics, and refractory industries
Product Overview:
Tantalum disilicide (TaSi2) is a metal silicide made from tantalum and silicon, widely used in high-temperature applications. Its excellent high-temperature stability and chemical inertness make it an ideal material for various industrial applications.
Product Features:
- High Purity:Ensures stability and reliability in various high-performance applications.
- High-Temperature Resistance:Exhibits exceptional thermal performance in high-temperature environments, making it suitable for high-temperature applications.
- Chemical Stability:Resistant to most chemicals, especially under high-temperature conditions, offering superior performance.
Applications:
- Fine Ceramic Materials:Used in the ceramics industry as a key high-performance material.
- Electrical Contacts:Ideal for manufacturing high-durability electrical contacts, providing stable electrical performance.
- Semiconductor Devices:Applied in the semiconductor industry for high-temperature durable materials, supporting efficient semiconductor applications.
