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Cobalt Silicide (CoSi₂) is an intermetallic compound composed of cobalt and silicon. It is widely used in microelectronics, semiconductor devices, and thin-film applications due to its low electrical resistivity, thermal stability, and compatibility with silicon-based technologies. CoSi₂ is commonly employed in contact metallization, diffusion barriers, and high-temperature coatings.
Product Overview
Cobalt silicide (CoSi2) is a compound made from cobalt and silicon elements, known for its excellent thermal stability, mechanical properties, and electrical conductivity. Its high melting point and density make it perform exceptionally well under high-temperature and high-pressure conditions. Cobalt silicide is widely used in the semiconductor industry, chemical research, and the production of very large-scale integrated circuits (VLSI). Due to its unique properties, cobalt silicide has become a key material in various advanced technology fields.
Product Features
- High Melting Point:With a high melting point of 1277°C, it is suitable for high-temperature applications.
- Good Electrical Conductivity:Cobalt silicide has good conductivity, making it suitable for use in electronic components.
- High Density:With a density of 5.30g/cm³, it offers significant advantages in multiple applications.
- Excellent Mechanical Properties:Provides strong hardness and wear resistance, making it ideal for extreme working conditions.
- Chemical Stability:Exhibits good chemical stability, maintaining performance in various chemical environments.
Applications
- Semiconductor Industry:Cobalt silicide is widely used in very large-scale integrated circuits (VLSI) as a key material for production and characterization.
- Chemical Research:In chemical reactions and catalytic studies, cobalt silicide can serve as a catalyst or catalyst support.
- High-Temperature Alloys:Due to its high melting point and heat resistance, cobalt silicide can be used in manufacturing high-temperature alloys for demanding environments.
- Electronic Components:As a conductive material, cobalt silicide is widely used in various electronic components, providing excellent electrical performance.
- Materials Science:In the development of new materials, cobalt silicide is an important subject of research as an advanced material.
| Technical Parameters | Values |
| Name | Cobalt Silicide (CoSi₂) |
| CAS Number | 12017-12-8 |
| Molecular Formula | CoSi₂ |
| Product Code | 271400PD |
| Purity | 99% |
| Specification | -20 mesh |
| EINECS Number | 234-616-8 |
