Nickel-Chromium-Silicon (NiCrSi) Target Material

Product Overview:
High Purity Nickel-Chromium-Silicon Alloy Target Material is widely used in electronic components, offering high resistivity, excellent oxidation resistance, and superior high-temperature performance. It operates effectively within a temperature range of 500°C to 900°C, maintaining high strength and exhibiting good processability and weldability at elevated temperatures.

Features:

• High Resistivity:Ideal for high-precision electronic circuits and resistance materials.
• Good Oxidation Resistance:Stable performance in high-temperature environments.
• Strong Temperature Resistance:Retains strength at elevated temperatures, suitable for high-temperature applications.
• Excellent Processability:Good weldability allows for the manufacturing of various target shapes.

Applications:

1. Semiconductor Industry:Used for manufacturing electrodes and interconnection films in semiconductor integrated circuits, ensuring stable circuit signal transmission.
2. Electronic Devices:Suitable for producing thin-film resistors with stable resistance values and low temperature coefficients, meeting high precision requirements.
3. Solar Energy Industry:Applied in the thin-film structures of solar cells, such as electrodes and reflective layers, to enhance photovoltaic conversion efficiency.
4. Display Technology:Utilized in transparent conductive film electrodes for Liquid Crystal Displays (LCDs) and Organic Light Emitting Diode (OLED) displays.
5. Decorative Coating:Provides a metallic luster and specific colors to product surfaces through sputtering, enhancing aesthetics and wear resistance.
6. Tool Coating:Nickel-chromium-silicon alloy films are deposited on cutting tools and molds to improve hardness and wear resistance, extending tool lifespan.