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Chromium Silicide (CrSi₂) is a high-performance intermetallic compound composed of chromium and silicon. It is known for its exceptional thermal stability, electrical conductivity, and oxidation resistance, making it ideal for high-temperature coatings, semiconductor applications, and advanced ceramic materials. With a melting point of approximately 1,475°C, CrSi₂ is widely used in electronics, aerospace, and refractory industries.
Product Overview
Chromium silicide (CrSi₂) is a compound of chromium and silicon, known for its excellent physical and chemical properties. Its high melting point, high corrosion resistance, and good electrical properties make it an ideal material for use in electronics, semiconductors, and aerospace industries. Chromium silicide is offered in powder form and is widely used in targets, coatings, and high-temperature materials.
Product Features
- High Melting Point: Chromium silicide has a high melting point, making it suitable for high-temperature environments.
- Excellent Electrical Properties: Demonstrates outstanding conductivity, making it ideal for electronics and semiconductor applications.
- High Corrosion and Oxidation Resistance: Remains stable in high-temperature and corrosive environments.
- Good Ductility: Maintains good ductility at high temperatures, making it adaptable to various industrial applications.
Applications
- Target Materials: Used to produce chromium silicide sputtering targets, widely used in thin-film coating industries.
- Thin Film and Glass Coatings: Used as a coating material to improve wear resistance and oxidation resistance of thin films and glass.
- Semiconductor Crucibles: Used for semiconductor thin film production, enhancing production efficiency.
- Aerospace Industry: Due to its high-temperature performance, chromium silicide is widely used in the aerospace industry.
- Plastic Molding Industry: Combined with nickel to enhance the performance of plastic molds.
| Technical Parameters | Values |
| Brand | CrSi₂ |
| Chemical Composition (%) | Cr: 48.61%, Si: 51.16%, Fe: 0.06%, Al: 0.04%, O: 0.03%, C: 0.02%, S: 0.0004% |
| Particle Size | -40 mesh to -200 mesh or on-demand processing |
