Cobalt Disilicide (CoSi₂)

Product Overview
Cobalt disilicide (CoSi₂) is a material with low resistivity and excellent thermal stability. It appears as a gray silicide ceramic powder. With a crystal structure similar to that of silicon, CoSi₂ is widely used in large-scale integrated circuits. Through specialized synthesis methods, CoSi₂ can be formed on silicon substrates to create CoSi₂/Si structures for studying the interface characteristics between metals and semiconductors.

Product Features

• Low Resistivity: Offers excellent electrical conductivity, making it suitable for high-performance electronic applications.
• Good Thermal Stability: Maintains stability in high-temperature environments, ideal for harsh operating conditions.
• Strong Chemical Stability: Does not easily decompose or react under appropriate conditions, resistant to strong acids, alkalis, and other corrosive substances.
• Silicon Substrate Compatibility: Can form CoSi₂/Si structures for studying interface properties and metal-semiconductor connections.

Applications

• Large-Scale Integrated Circuits: Used for connections between metals and semiconductors in integrated circuits, offering excellent conductivity and stability.
• Semiconductor Devices: Serves as a connection material between semiconductor base electrodes and metal wires, widely applied in semiconductor devices.
• Metal-Silicon Interface Research: Used for studying the interface characteristics of epitaxial metal-silicon layers, providing technical support for advanced electronic materials.