Zirconium silicide is a high-purity intermetallic compound recognized for its excellent electrical conductivity, thermal stability, and oxidation resistance. It is widely used in high-temperature coatings, semiconductor technology, aerospace applications, and specialized electronic components. Due to its superior durability and efficiency, zirconium silicide plays a crucial role in advanced materials engineering, scientific research, and precision manufacturing.
Product Overview
Zirconium Silicide (ZrSi2) is a gray, cubic crystalline powder with a high melting point (1620°C) and a density of 4.88 g/cm³. It is a silicide compound widely used in high-temperature environments, especially in advanced ceramics and semiconductor manufacturing.
Product Features
- High Melting Point: With a melting point of 1620°C, it is suitable for high-temperature applications.
- High Density: The material has a high density, which contributes to its stability.
- Chemical Stability: It offers excellent oxidation resistance and high-temperature durability.
Applications
- Advanced Ceramics: Used as a raw material powder for high-performance ceramic products.
- Semiconductor Thin Film Production: Ideal for use in crucibles for semiconductor thin film production due to its resistance to high temperatures and chemical corrosion.