Vanadium disilicide is a high-purity intermetallic compound known for its exceptional electrical conductivity, thermal stability, and oxidation resistance. It is widely used in high-temperature coatings, electronic components, and advanced ceramic materials due to its superior durability and efficiency. This compound plays a crucial role in specialized aerospace applications, semiconductor technology, and scientific research, ensuring reliable performance in demanding environments.
Product Overview:
Vanadium disilicide (V₂Si) is an intermetallic compound widely used in the preparation of vanadium silicide films. It can be directly synthesized into high-quality silicide films under high ion beam density of vanadium metal ions, offering excellent electrical conductivity. After high-temperature annealing, the resistivity of the vanadium silicide films significantly decreases, showcasing excellent thermal stability. Transmission electron microscope (TEM) analysis reveals that the vanadium silicide thin film has a thickness of around 80nm and maintains low resistivity at high temperatures, demonstrating good stability.
Product Features:
- Low Resistivity:After high-temperature annealing, the resistivity of vanadium disilicide thin films can be reduced to 72μΩ·m, indicating significantly improved conductivity.
- Excellent Thermal Stability:After annealing at 1200°C, vanadium disilicide still maintains low resistivity, demonstrating outstanding thermal stability.
- Multiple Vanadium Silicide Phases:Under specific conditions, various vanadium silicide phases (such as V₃Si, V₅Si₃) can form in the injected layers.
Applications:
- Microelectronics Industry:Used for preparing vanadium silicide films for applications in integrated circuits, semiconductor manufacturing, and other electronic devices.
- Materials Science:A high-quality thin silicide material widely used in research and application for creating advanced thin-film structures.
- High-Temperature Applications:Due to its excellent thermal stability, it is suitable for use in environments requiring high-temperature performance.