Iron-Cobalt-Boron Target

Product Overview:
The iron-cobalt-boron target is an important magnetic material composed of iron (Fe), cobalt (Co), and boron (B). This alloy combines the excellent magnetic properties of iron and cobalt with the unique chemical characteristics of boron, allowing it to form thin films with outstanding magnetic performance and fine particles during the physical vapor deposition (PVD) process.

Features:

· Superior Magnetic Performance: Combines the excellent magnetic characteristics of iron and cobalt, making it suitable for high-performance magnetic material applications.

· Chemical Stability: The addition of boron enhances the chemical stability of the alloy.

· High Purity: Ensures the performance of the target and the quality of the deposited films.

Manufacturing Process:

1. Raw Material Preparation: High-purity iron, cobalt, and boron powders, with a purity requirement of over 99.9%.

2. Powder Mixing: The powders are mixed in a ball mill for several hours to ensure uniformity.

3. Pressing: The mixed powders are pressed into shape in a mold under pressures ranging from several hundred to several thousand megapascals.

4. Sintering: The pressed target is placed in a sintering furnace, typically at temperatures from a few hundred to over a thousand degrees Celsius, for several hours to tens of hours.

5. Processing: The sintered target undergoes cutting, grinding, and polishing to achieve the desired dimensions and surface quality.

Applications:

· Magnetic Materials: Widely used in the manufacture of high-performance magnetic materials, such as magnetic heads and storage media.

· Electronics Industry: Utilized in thin film deposition for semiconductors and microelectronic devices to enhance device performance.

· Photovoltaic and Optoelectronic Devices: Plays a significant role in the production of photovoltaic films and optoelectronic devices.