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Product Overview
Magnesium sputtering targets are high-purity magnesium metal materials primarily used for vacuum deposition, thin film deposition in electronic and optoelectronic fields, and other advanced technological applications. With their low density and good plasticity, magnesium sputtering targets are widely applied in various industries, particularly in electronics, optoelectronics, military, and decorative coatings.
Features
- High Purity: Made from 4N (99.99%) pure magnesium, ensuring the high efficiency and stability of the sputtering target.
- Optimal Density: Moderate density (1.74 g/cm³), allowing for easy molding and adaptability to different processing needs.
- Low Oxidation: Rolled to a dense structure with minimal oxidation, improving the lifespan and performance of the target.
- Customizable: Available in custom sizes to meet specific customer requirements, with support for sample or drawing-based processing.
Applications
Magnesium sputtering targets are used across various fields, including:
- Vacuum Coating: Widely used in electronic, optoelectronic, and other thin film deposition technologies.
- Electronics and Optoelectronics: Used for thin film preparation in semiconductor devices, displays, and optical components.
- Military: Applied in military sectors for special coatings and functional films.
- Decorative Coatings: Used for decorative coatings on metals and other materials.
- Functional Films: Utilized in the production of high-performance films, such as conductive, optical, or protective coatings.
- Corrosion Protection: Applied in corrosion protection, especially for underground facilities, oil pipelines, and storage tanks.
