new material
Product Overview
High purity molybdenum target material is a silver-gray metal known for its high hardness and excellent high-temperature performance, with a melting point of 2617°C and a density of 10.2 g/cm³. It is widely used in plasma sputtering technology, where an electric field accelerates argon atoms to bombard the target's surface, causing neutral atoms from the target to deposit onto the substrate to form thin films. Molybdenum target material must meet strict requirements in terms of purity, density, microstructure, and welding quality to ensure optimal performance during the sputtering process.
Product Features
- High Purity:Purity of 3N5 ensures high performance and stability of the target material.
- High Temperature Resistance:Molybdenum's melting point of 2617°C makes it ideal for high-temperature applications.
- Superior Physical Properties:Hardness of 5.5 and density of 10.2 g/cm³ ensure durability under high-pressure and high-temperature conditions.
- Precision Manufacturing:Produced through multiple processes (pressing, sintering, rolling, cutting) to ensure quality and precise geometric dimensions.
Applications
- Plasma Sputtering Industry:Used as a target material for coating technologies, especially in the preparation of semiconductor and optoelectronic films.
- Electronic Semiconductor Industry:Used in the deposition of thin films on electronic devices to enhance electrical performance and durability.
- Aerospace and Mechanical Manufacturing:Molybdenum's high heat resistance and corrosion resistance make it ideal for use in high-temperature and corrosive environments, such as in aerospace applications.
- Petrochemical Industry:Used as a high-temperature resistant material in high-temperature reaction environments.
