High Purity Vanadium (V) Target
High Purity Vanadium (V) Target
High Purity Vanadium (V) Target
High Purity Vanadium (V) Target

High Purity Vanadium (V) Target

  • element:V
  • purity:3N
  • shape:Target
  • specification:D25.4 x 6.35 mm, D50.8 x 3 mm, D75 x 100 mm (or custom sizes)
  • packaging:Triple vacuum packaging or argon gas protection, compliant with IATA and DOT packaging regulations

High purity vanadium (V) target is a high-purity material used in various industrial applications, including thin film deposition, semiconductor production, and aerospace manufacturing. It is known for its excellent strength, corrosion resistance, and unique properties.

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Product Overview
The high purity vanadium target is a silver-colored metal target with an exceptionally high purity of 99.9%. It is widely used in thin-film deposition processes such as magnetron sputtering. Vanadium targets possess a high melting point (1890°C) and boiling point (3380°C), along with excellent corrosion resistance, particularly in environments exposed to hydrochloric acid, sulfuric acid, gases, saltwater, and water. Due to its high-temperature stability, corrosion resistance, and excellent electrical conductivity, vanadium targets are critical in various high-tech applications.

Key Features

  • High Purity: With a purity of 99.9%, the vanadium target ensures exceptional stability and reliability in precision applications.
  • Excellent Corrosion Resistance: Vanadium targets are highly resistant to hydrochloric acid, sulfuric acid, and have superior corrosion resistance to most stainless steels, particularly in corrosive environments including gases, saltwater, and water.
  • High Temperature Stability: With a melting point of 1890°C and a boiling point of 3380°C, vanadium targets are ideal for applications under extreme conditions.
  • Superior Sputtering Performance: These targets are suitable for magnetron sputtering processes, providing high-quality and uniform thin-film deposition.

Applications
High purity vanadium targets are widely used across various advanced industries:

  • Solar Industry: Used in thin-film deposition applications such as solar cell integration and backplane metallization.
  • Flat Panel Displays: Commonly used in optoelectronics and display manufacturing in the flat-panel display industry.
  • Electronics & Semiconductors: In electronics and semiconductor fields, vanadium targets are used for thin-film deposition in integrated circuits, optoelectronics, and other components.
  • Hydrogen Storage Alloys & Hydrogen Separation Membranes: Vanadium thin films, due to their unique hydrogen storage capabilities, high-temperature superconductivity, neutron absorption properties, and resistance to liquid sodium, are commonly used in hydrogen storage alloys and hydrogen separation membranes.
  • High-Temperature Superconducting Materials: Vanadium targets are essential in the development of high-temperature superconducting materials, as well as in protecting fuel rods for advanced reactors and heat-dissipating components.
ElementMeasured ValueStandard ValueUnitElementMeasured ValueStandard ValueUnitElementMeasured ValueStandard ValueUnit
LippmZn<50ppmPb<20ppm
BppmGappmBi<20ppm
FppmGeppmYppm
NappmAs<20ppmThppm
Mg<20ppmSeppmErppm
Al<20ppmZr<20ppmRuppm
SippmNb<50ppmRhppm
PppmMo<50ppmOsppm
ClppmPdppmCsppm
K<10ppmAgppmCd<20ppm
Ca<10ppmSn<20ppm
Ti<10ppmSb<20ppm
VMatrixppmBappm
Cr<50ppmHfppm
Mn<50ppmTa<50ppmC<20ppm
Fe<100ppmW<50ppmS<20ppm
Co<100ppmPtppmO<20ppm
NippmAuppmN<20ppm
Cu<100wt%HgppmHppm
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