High Purity Tantalum Target
High Purity Tantalum Target
High Purity Tantalum Target
High Purity Tantalum Target
High Purity Tantalum Target
High Purity Tantalum Target

High Purity Tantalum Target

  • element:Ta
  • purity:3N5 (99.95%) - 4N (99.99%)
  • shape:Flat target, Rotating target, Custom-shaped target
  • specification:Customizable (Common sizes: D32x1.75mm, D76.2x3.175mm)
  • packaging:Triple vacuum packaging or argon gas protection, in compliance with IATA and DOT packaging standards

High purity tantalum target is a high-purity material used in various industrial applications, including thin film deposition, semiconductor production, and medical devices. It is known for its excellent corrosion resistance, high melting point, and unique properties.

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Product Overview
High purity tantalum targets are produced from high-purity tantalum powder through processes like sintering, electron beam melting, repeated plastic deformation, and annealing. These targets offer exceptional thermal stability and excellent electrical conductivity. Tantalum targets are widely used in the electronics, semiconductor, and optics industries, particularly in magnetron sputtering and thin-film deposition applications. With their high density and excellent high-temperature properties, they are particularly favored in high-end applications, including capacitors, engine turbine blades, and chemical processing equipment.

Features

  • Excellent Electrical Conductivity and Thermal Stability: Tantalum targets have outstanding electrical conductivity and resistance to high temperatures, making them suitable for use in extreme conditions.
  • High Density and Ductility: The high density of tantalum ensures excellent mechanical properties, and it maintains stability under high-temperature conditions.
  • Versatile Shapes: Available in flat, rotating, and custom shapes to meet specific application needs.
  • Precision Manufacturing: Advanced electron beam melting technology ensures the high purity and uniformity of the target material.

Applications
High purity tantalum targets are extensively used in the following industries:

  • Electronics: Tantalum targets are widely used in capacitor production, especially in high-end applications such as telecommunications, data storage, and medical devices.
  • Semiconductor Industry: Used in Physical Vapor Deposition (PVD) processes to deposit thin films on semiconductor substrates, forming diffusion barriers for copper interconnects.
  • Aerospace: In aerospace applications, tantalum targets are used for producing high-temperature alloys, such as those used in turbine blades, due to their excellent heat resistance and corrosion resistance.
  • Chemical Processing: Tantalum’s corrosion resistance makes it an ideal material for equipment in the chemical and pharmaceutical industries, often used in manufacturing containers, pipes, valves, and heat exchanger linings.
  • Optics and Thin Film Technology: Tantalum targets are commonly used in optical coating, flat-panel displays, and functional material thin films.
ElementMeasured ValueStandard ValueUnitElementMeasured ValueStandard ValueUnitElementMeasured ValueStandard ValueUnit
LippmZnppmPbppm
BppmGappmBippm
FppmGeppmYppm
NappmAsppmThppm
MgppmSeppmErppm
AlppmZr<10ppmRuppm
Si<10ppmNb<150ppmRhppm
PppmMo<10ppmOsppm
ClppmPdppmCsppm
KppmAgppm
CappmSnppm
Ti<10ppmSbppm
VppmBappm
Cr<10ppmHfppm
Mn<10ppmTaMatrixwt%C<10ppm
Fe<10ppmW<100ppmS<10ppm
CoppmPtppmO<20ppm
Ni<10ppmAuppmN<5ppm
Cu<10ppmHgppmH<5ppm
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