Extreme Ultraviolet (EUV) 116nm Lithium Fluoride (LiF)

Product Overview:
Extreme Ultraviolet (EUV) 116nm lithium fluoride is a high-performance optical crystal with a tetragonal crystal structure, specifically designed for extreme ultraviolet optical systems, especially for applications in the 116nm wavelength range. This material is characterized by its high purity, high density, and low impurity content, offering exceptional light transmission and optical stability. It is widely used in the manufacture of high-precision and high-stability optical components, such as lenses, prisms, and windows. Due to its unique optical properties, EUV 116nm lithium fluoride excels in high-power laser systems, optical communications, and laser technologies.

Key Features:

• High Transparency:Offers excellent transmission in the extreme ultraviolet range, ideal for EUV optical applications.
• High Refractive Index:Effectively controls the light propagation path, enhancing the performance of optical components.
• Low Dispersion:Reduces chromatic aberrations in optical systems, ensuring clarity and sharpness of images.
• High Chemical Stability:Resistant to corrosion, high temperatures, and intense light, ensuring long-term stable operation in extreme environments.
• High Purity & Low Impurities:Guarantees high-quality performance in high-precision optical applications.
• Excellent Optical Performance:Features high stability and low scattering, making it suitable for precision optical systems.

Applications:

• Optical Instrument Manufacturing:Used to manufacture high-precision optical components such as lenses, prisms, and window plates, widely applied in various optical systems.
• Laser Technology:Serves as a key optical component in high-power laser systems, improving system performance and stability.
• Optical Communication:Used in the production of fiber optics and optical devices, supporting high-speed, high-capacity data transmission.
• Telescopes and Optical Equipment:Suitable for the manufacture of high-precision telescopes and other optical devices, enhancing the resolution of optical systems.
• High-Power Laser Systems:Used in the production of mirrors, reflectors, and reflective prisms, ensuring the stability and efficiency of systems under extreme conditions.