Product Overview:
High purity iron targets are silver-white metallic materials specifically designed for sputtering applications. With a melting point of 1535°C, density of 7.86 g/cm³, and boiling point of 2750°C, these targets exhibit excellent corrosion resistance, film hardness, and smoothness, making them ideal for high-performance thin film deposition.
Features:
- High Purity:Ensures film quality by minimizing impurity effects.
- Excellent Physical Properties:High melting point and moderate density suitable for various industrial applications.
- Customization Options:Targets can be tailored to meet specific customer requirements regarding size and shape.
Applications:
Magnetron Sputtering:
- Used in the production of high-performance thin films, including permanent and soft magnetic materials.
Functional Material Films:
- Suitable for the fabrication of electronic devices and optoelectronic materials.
High-End Electronic Components:
- Applied in premium electronic and optoelectronic devices to enhance performance.
Element | Measured Value | Standard Value | Unit | Element | Measured Value | Standard Value | Unit | Element | Measured Value | Standard Value | Unit |
Li | ppm | Zn | <5 | ppm | Pb | <10 | ppm | ||||
B | ppm | Ga | ppm | Bi | <10 | ppm | |||||
F | ppm | Ge | ppm | Y | ppm | ||||||
Na | ppm | As | <5 | ppm | Th | ppm | |||||
Mg | <5 | ppm | Se | ppm | Er | ppm | |||||
Al | <10 | ppm | Zr | <5 | ppm | Ru | ppm | ||||
Si | ppm | Nb | <5 | ppm | Rh | ppm | |||||
P | ppm | Mo | <5 | ppm | Os | ppm | |||||
Cl | ppm | Pd | ppm | Cd | <2 | ppm | |||||
K | <5 | ppm | Ag | ppm | |||||||
Ca | <5 | ppm | Sn | <10 | ppm | ||||||
Ti | <5 | ppm | Sb | <10 | ppm | ||||||
V | <5 | ppm | Ba | ppm | |||||||
Cr | <5 | ppm | Hf | ppm | |||||||
Mn | <5 | ppm | Ta | <5 | ppm | C | <20 | ppm | |||
Fe | Matrix | ppm | W | <10 | ppm | S | <20 | ppm | |||
Co | <10 | ppm | Pt | ppm | O | <20 | ppm | ||||
Ni | <10 | ppm | Au | ppm | N | <20 | ppm | ||||
Cu | <10 | wt% | Hg | ppm | H | ppm |