new material
Chlorine-free synthetic quartz is a high-purity optical material engineered without chlorine-based compounds to ensure superior environmental sustainability, extreme thermal stability, and outstanding optical clarity. Manufactured through advanced purification and growth techniques, it provides minimal impurities, excellent UV and IR transmission, and high chemical resistance. This material is widely used in semiconductor fabrication, precision optics, laser applications, and aerospace instrumentation, offering reliable performance in demanding environments.
Product Overview
Chlorine-free synthetic quartz is manufactured using an environmentally-friendly organic silicon process, ensuring the material is chlorine-free, bubble-free, and ultra-pure. As one of the cleanest materials used in semiconductor applications, its excellent transparency and radiation resistance make it ideal for ultraviolet (UV) applications. Chlorine-free synthetic quartz meets the stringent requirements of high-end optics, semiconductors, and other high-precision instruments, providing extremely stable optical performance and high purity.
Key Features
- Chlorine-Free and Bubble-Free: Manufactured using an eco-friendly process, ensuring the material is free from chlorine and bubbles, preventing any impact on high-precision applications.
- Ultra High Purity: The material has an exceptionally high purity level, ensuring no impurities are present, making it suitable for high-precision applications.
- Excellent Transparency: Offers outstanding transmission in the ultraviolet (UV) spectrum, ideal for optical systems requiring high transparency and stability.
- Radiation Resistance: Exhibits excellent radiation resistance, maintaining its optical properties and structural stability in high-radiation environments.
Applications
- Semiconductor Industry: Used as a clean, high-purity material in the production of high-precision optical components for semiconductor manufacturing.
- UV Applications: Provides excellent light transmission in the UV spectrum, making it suitable for high-precision optical instruments.
- High-End Optical Systems: Used in high-end optical devices such as lenses, windows, and mirrors, ensuring high precision and stability in optical systems.
- Radiation Environments: Suitable for optical applications in high-radiation environments, offering excellent radiation resistance.
- High-Precision Instruments: Widely used in precision instruments and high-end optical equipment, ensuring long-term stable performance.
| Property | Value |
| Metallic Impurity Content | ＜0.1 ppm |
| Chlorine Content | ＜1 ppm |
| Hydroxyl Content | 800-1000 ppm |
| Temperature Rise | 3℃ (8000W, 1200Hz, 150s) |
| Laser Damage Threshold (Bulk Damage, 355nm) | 16.033 J/cm² |
| Weak Absorption by Calorimetry | 0.3%-0.5% (193nm) |
