{"id":2222,"date":"2025-04-22T15:04:43","date_gmt":"2025-04-22T07:04:43","guid":{"rendered":"https:\/\/www.hi-tech-materials.com\/?post_type=product&p=2222"},"modified":"2025-04-22T15:07:48","modified_gmt":"2025-04-22T07:07:48","slug":"titanium-silicide-tisi%e2%82%82","status":"publish","type":"product","link":"https:\/\/www.hi-tech-materials.com\/zh\/product\/titanium-silicide-tisi%e2%82%82","title":{"rendered":"Titanium Silicide (TiSi\u2082)"},"content":{"rendered":"
Product Overview<\/strong> Product Features<\/strong><\/p>\n Applications<\/strong><\/p>\n Titanium Silicide (TiSi\u2082) is an advanced intermetallic compound<\/strong> composed of titanium and silicon. It is widely recognized for its high electrical conductivity, thermal stability, and oxidation resistance<\/strong>. This material is extensively used in semiconductor manufacturing, thin-film coatings, and high-temperature applications<\/strong> due to its excellent performance in extreme environments.<\/p>\n
\nTitanium silicide (TiSi\u2082) is a compound with high chemical stability, widely used in the semiconductor industry. With a molecular weight of 104.04, it is often grown on polycrystalline silicon lines using hydration techniques to reduce the sheet resistance in localized transistor connections. Titanium silicide is essential during the C54 phase of the microelectronics industry. It is also used in producing fine ceramic powders and semiconductor thin film production crucibles.<\/p>\n\n
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