{"id":2157,"date":"2025-04-22T14:00:16","date_gmt":"2025-04-22T06:00:16","guid":{"rendered":"https:\/\/www.hi-tech-materials.com\/?post_type=product&p=2157"},"modified":"2025-04-22T14:01:36","modified_gmt":"2025-04-22T06:01:36","slug":"vanadium-disilicide-v%e2%82%82si","status":"publish","type":"product","link":"https:\/\/www.hi-tech-materials.com\/zh\/product\/vanadium-disilicide-v%e2%82%82si","title":{"rendered":"Vanadium Disilicide (V\u2082Si)"},"content":{"rendered":"
Product Overview:<\/strong> Product Features:<\/strong><\/p>\n Applications:<\/strong><\/p>\n Vanadium disilicide is a high-purity intermetallic compound known for its exceptional electrical conductivity, thermal stability, and oxidation resistance. It is widely used in high-temperature coatings, electronic components, and advanced ceramic materials due to its superior durability and efficiency. This compound plays a crucial role in specialized aerospace applications, semiconductor technology, and scientific research, ensuring reliable performance in demanding environments.<\/p>\n
\nVanadium disilicide (V\u2082Si) is an intermetallic compound widely used in the preparation of vanadium silicide films. It can be directly synthesized into high-quality silicide films under high ion beam density of vanadium metal ions, offering excellent electrical conductivity. After high-temperature annealing, the resistivity of the vanadium silicide films significantly decreases, showcasing excellent thermal stability. Transmission electron microscope (TEM) analysis reveals that the vanadium silicide thin film has a thickness of around 80nm and maintains low resistivity at high temperatures, demonstrating good stability.<\/p>\n\n
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