Tungsten Silicide (WSi2)

Product Overview
Tungsten silicide (WSi2) is a compound of tungsten and silicon, known for its high melting point and good electrical conductivity. As an inorganic compound, tungsten silicide is a typical conductive ceramic material with excellent thermal stability and oxidation resistance. Its blue-gray, tetragonal crystal structure makes it suitable for high-temperature environments.

Product Features

• High Melting Point:With a melting point of 2160°C, it is ideal for high-temperature applications.
• Electrical Conductivity:It has a low resistivity of 60-80 μΩ cm, making it suitable for microelectronics.
• High Temperature Resistance:It remains stable in high-temperature environments, particularly at 1000°C.
• Oxidation Resistance:It performs well in high-temperature radiation cooling and insulation applications.

Applications

• Microelectronics:Used as contact materials to improve signal speed.
• Thin Film Deposition:Serves as a current shunt for polycrystalline silicon lines to enhance conductivity.
• Microelectromechanical Systems (MEMS):Used in the production of thin films for microcircuits.
• High-Temperature Radiation Cooling:Used as a high emissivity coating in high-temperature environments for oxidation protection.
• Barrier Layers:Acts as a barrier between silicon and other metals, such as tungsten.