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Tungsten silicide (WSi₂) is a high-purity intermetallic compound valued for its exceptional thermal stability, electrical conductivity, and oxidation resistance. It is widely used in semiconductor manufacturing, microelectronics, high-temperature coatings, and advanced aerospace applications. Due to its superior durability and efficiency, tungsten silicide plays a critical role in scientific research, precision engineering, and specialized material development.
Product Overview:
Tungsten silicide (WSi₂) is a blue-gray tetragonal crystal that is insoluble in water and aqua regia but can dissolve in a mixture of nitric acid and hydrofluoric acid. With a high melting point of over 900°C, it exhibits excellent stability and oxidation resistance in high-temperature environments. It is widely used in high-performance materials.
Product Features:
- High Melting Point:With a melting point exceeding 900°C, it is suitable for high-temperature applications.
- Strong Chemical Stability:It resists oxidation and is durable in highly acidic environments.
- Good Oxidation Resistance:Ideal for use as protective coatings and in the manufacture of resistive wires.
Applications:
- Oxidation-Resistant Coatings:Used to protect materials in high-temperature environments from oxidation.
- Resistive Wire Coatings:Applied in the manufacturing of resistive wires for electronic and electrical devices.
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