Silicon Nitride Ceramic Target

Product Overview

Silicon nitride ceramic targets are high-purity materials manufactured through pressing and sintering processes, primarily used in sputter deposition and microfabrication applications. With outstanding thermal stability, mechanical properties, and high-temperature resistance, they are ideal for high-precision processes and high-temperature environments. The melting point of silicon nitride reaches 1900°C, making it highly effective in extreme conditions. These targets are used for producing high-precision electronic components and complex industrial materials.

Key Features

• High Melting Point: Melting point of up to 1900°C, making it suitable for high-temperature environments.
• High Hardness: Excellent hardness and wear resistance, ensuring long-lasting performance.
• Good Thermal Stability: Maintains structural integrity and functionality at high temperatures.
• High Purity: Available in 3N and 4N purities, ensuring superior performance.

Applications

• Microfabrication & Etching: Widely used as etching masks and insulators in integrated circuits.
• High-Temperature Materials: Suitable for materials used in rocket engines, aerospace equipment, and other high-temperature applications.
• Bearings & Mechanical Components: Silicon nitride’s hardness and wear resistance make it ideal for high-load bearings and mechanical components.
• Chemical Barriers: Used as chemical barrier materials for protection in high-temperature and chemically aggressive environments.
• Electronics Industry: Suitable for high-temperature electronic components and devices in the electronics sector.