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Molybdenum-Niobium Alloy Target is a high-performance material known for its excellent thermal and electrical conductivity, corrosion resistance, and high-temperature stability. This alloy is widely used in various industries, including electronics, aerospace, and medical devices, where it serves in critical components exposed to demanding environments. Its unique properties make it ideal for applications requiring durability, reliability, and high performance.
Product Overview
Molybdenum-Niobium Alloy Target (MoNb) is a high-performance alloy with low permeability, high flexibility, and transparent dielectric properties, primarily used as a substitute for ITO materials. This alloy exhibits excellent characteristics such as high power, low resistivity, and low brittleness, making it ideal for applications like flat-panel display sputtering. The alloy features uniform structure and composition, fine-grained microstructure, high reflectivity, and excellent etching performance, ensuring stable evaporation rates. Its low evaporation temperature and work function make it highly effective in high-efficiency applications.
Features
- High Density and Compactness: Density greater than 99%, with excellent compactness and uniform grain structure.
- Superior Machining Performance: Easy to process, suitable for precision applications.
- Low Resistivity and Low Evaporation Temperature: Enhances work efficiency.
- High Reflectivity and Stability: High reflectivity and low resistivity ensure stable evaporation performance.
- Uniform Thin Film: The target material produces thin films with over 95% uniformity.
Applications
- Flat-Panel Display Sputtering: Widely used as a target material for magnetron sputtering in flat-panel displays.
- Electronics and Optoelectronics: Suitable for thin-film deposition in electronic components and optoelectronic devices.
- High-Efficiency Coating Technologies: Applicable in high-performance coating processes and related fields.
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