High Purity Iron Target

Product Overview:
High purity iron targets are silver-white metallic materials specifically designed for sputtering applications. With a melting point of 1535°C, density of 7.86 g/cm³, and boiling point of 2750°C, these targets exhibit excellent corrosion resistance, film hardness, and smoothness, making them ideal for high-performance thin film deposition.

Features:

• High Purity:Ensures film quality by minimizing impurity effects.
• Excellent Physical Properties:High melting point and moderate density suitable for various industrial applications.
• Customization Options:Targets can be tailored to meet specific customer requirements regarding size and shape.

Applications:

Magnetron Sputtering:

• Used in the production of high-performance thin films, including permanent and soft magnetic materials.

Functional Material Films:

• Suitable for the fabrication of electronic devices and optoelectronic materials.

High-End Electronic Components:

• Applied in premium electronic and optoelectronic devices to enhance performance.