Copper Target
Copper Target
Copper Target
Copper Target

Copper Target

  • element:Copper (Cu)
  • purity:4N, 5N
  • shape:Flat Target, Rotating Target
  • specification:1 Kg
  • packaging:Triple vacuum packaging or argon gas protection, in compliance with IATA and DOT packaging standards

Copper target is a high-purity material used in various industrial applications, including thin film deposition, semiconductor production, and electrical engineering. It is known for its excellent electrical conductivity, thermal conductivity, and unique properties.

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Product Overview
High-purity copper targets are reddish-orange in color, with excellent melting point (1083°C) and high density (8.92 g/cc). They are ideal sputtering materials for vacuum deposition processes. With a vapor pressure of 10⁻⁴ Torr at 1,017°C, copper targets are especially suitable for high-precision electronic and optical coating processes. Due to their excellent electrical conductivity and good sputtering performance, copper targets are key materials for the electronics, display, and other high-tech industries.

Product Features

  • High Purity:Copper targets with 4N and higher purity ensure excellent performance and stability
  • Excellent Sputtering Performance:Suitable for high-precision vacuum deposition processes
  • High Electrical and Thermal Conductivity:Improves performance and efficiency of electronic components
  • High-Temperature Resistance:High melting point ensures suitability for high-temperature applications

Applications

  • Electronics Industry:Used in integrated circuits, information storage, liquid crystal displays (LCD), laser memory devices, and electronic control components
  • Glass Coating Field:Used for vacuum deposition on glass surfaces to improve corrosion resistance and functionality
  • Wear-Resistant Materials Industry:Used in high-strength wear-resistant coatings
  • High-Temperature Corrosion Applications:Used in manufacturing high-temperature corrosion-resistant materials and high-end decorative items
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