Product Features

• High purity, ensuring excellent conductivity and stability of the thin films
• Uniform grain size, with an average particle diameter of less than 100μm
• Low gas content, ensuring high-quality film deposition
• Customizable composition based on customer requirements (e.g., WTi 90/10wt%, WTi 85/15wt%, etc.)
• Special annealing treatment, enhancing the target’s performance and lifespan

Applications

• Semiconductor Manufacturing:Used for thin-film diffusion barrier layers and adhesion layers, preventing direct contact between metal layers and semiconductor materials, improving the functionality and stability of microchips
• Thin-Film Solar Cells:Used as a barrier layer to prevent iron atoms in the steel substrate from diffusing into the molybdenum back contact and CIGS semiconductor, enhancing solar cell efficiency
• LED Manufacturing:Used for high-performance LED coatings, enhancing device performance and lifespan
• Tool Coatings:Provides high hardness and wear-resistant coatings for tools, improving their lifespan and processing accuracy

The Copper-Indium-Gallium-Selenium target is a high-purity semiconductor material composed of copper, indium, gallium, and selenium, extensively used in manufacturing thin-film solar cells. Produced through a vacuum melting process, it boasts high density and low gas content, making it an essential component for producing high-efficiency photovoltaic materials.

Key Features

• High Purity:With a purity of up to 99.99%, it ensures excellent electrical performance and photoelectric conversion efficiency.
• Variety of Forms:Available as both flat and rotating targets to suit different production requirements.
• Customizable Specifications:Offers customizable diameters and thicknesses, meeting various customer needs.

Applications

• Solar and Photovoltaic Industries:As a critical material for thin-film solar cells, CIGS targets play a pivotal role in the production of high-efficiency, cost-effective solar cells.

The Copper-Indium-Gallium alloy target is a crucial material for manufacturing Copper-Indium-Gallium Selenide (CIGS) thin-film solar cells, featuring excellent physical properties and chemical stability. XinKang utilizes vacuum melting methods to produce a variety of Copper-Indium-Gallium targets, offering high density and low gas content.

Key Features

• High Purity:The product purity reaches 4N and 5N, ensuring excellent conductivity during the sputtering process.
• Unique Production Process:Rotating targets are produced using melting methods, providing a technical advantage.
• Uniform Particle Size:The average particle size is less than 100 μm, contributing to the uniformity and stability of the films.

Applications

• Thin-Film Solar Cells:Primarily used in the production of Copper-Indium-Gallium Selenide (CIGS) thin-film solar cells, which exhibit high photoelectric conversion efficiency and radiation resistance.
• Photovoltaic Conversion:There is significant market potential in solar power generation and micro-satellite power sources.
• High-Performance Materials:Copper-Indium-Gallium alloy targets can produce fine particle films in physical vapor deposition, enhancing conductivity and film quality.

The Copper-Indium alloy target is a high-purity material primarily used for the production of Copper-Indium-Gallium Selenide (CIGS) thin-film solar cells. This target utilizes an alternating sputtering method for precise control over composition, ensuring the quality and performance of the films.

Key Features

• High Purity:Achieving purity levels of 4N and 5N ensures high performance during the sputtering process.
• Efficient Production:Advanced alternating sputtering technology enables high efficiency and uniform elemental ratios.
• Excellent Light Absorption:CIGSSe thin-film solar cells have a high absorption coefficient for visible light, contributing to good photoelectric conversion efficiency.

Applications

• Thin-Film Solar Cells:Used in the manufacture of efficient CIGS thin-film solar cells, suitable for ground-based solar power generation and micro-satellite power sources.
• Innovative Photovoltaic Technology:The application of Copper-Indium alloy targets in the photovoltaic sector can reduce generation costs while enhancing cell longevity and efficiency.

Product Features

• High purity (99.9% and 99.99%), ensuring target material quality and stability
• Excellent electrical conductivity and thermal stability
• Outstanding corrosion resistance and wear resistance
• Excellent elasticity and strength, suitable for high-load applications
• Customizable in different shapes and sizes to meet various application needs

Applications

• Optical Coatings:Used for coating optical elements such as mirrors and lenses, improving optical performance and wear resistance
• Electronics Industry:Widely used in sputter deposition for electronic devices, enhancing performance and lifespan
• Glass Coatings:Applied for glass surface coatings to improve light transmission, wear resistance, and anti-reflective properties
• Semiconductor Industry:Used in the preparation of solar cells, LEDs, and integrated circuits to improve device efficiency and stability
• Elastic Components and Wear-Resistant Parts:Copper-tin alloy’s excellent elasticity and wear resistance make it ideal for manufacturing durable and anti-magnetic mechanical parts

The Copper-Nickel-Titanium alloy target is a high-purity target material with a light yellow color, widely used in research experiments such as magnetron sputtering. Its unique physical and chemical properties make it an important material in the fields of semiconductor manufacturing and optical coatings.

Key Features

• High Purity:Achieves a purity of up to 99.95% (3N5) or higher (4N), ensuring excellent performance.
• Good Conductivity:Suitable for applications requiring efficient current interconnections.
• Thermal Stability:Maintains good performance in high-temperature environments.
• Customizable:Different specifications and shapes of targets can be provided according to customer requirements.

Applications

• Semiconductor Manufacturing:Used in the physical vapor deposition (PVD) process to form conductive and barrier layers, enhancing chip performance and reliability.
• Flat Panel Display Manufacturing:Employed in conductive channels and transparent conductive layers for TFT-LCD and OLED displays, improving display efficiency and color accuracy.
• Optical Coatings:Utilized for thin film deposition on optical devices, providing high-quality reflective coatings and adjusting light wavelengths to enhance optical performance.

The Copper-Nickel alloy target is a high-purity target material with a silver-white appearance, exhibiting excellent metallic luster. The addition of nickel to copper significantly enhances the alloy’s strength, corrosion resistance, hardness, and electrical resistance while reducing the temperature coefficient of resistivity, allowing it to perform exceptionally well in various applications.

Key Features

• Excellent Physical Properties:The inclusion of nickel notably increases copper’s strength and corrosion resistance while maintaining good conductivity.
• Various Specifications:Different shapes and sizes of targets can be provided based on customer requirements.
• High Density and Fine Grain:Density ≥ 16.67 g/cm³ and grain size smaller than 100 μm ensure the stability and uniformity of the target material.

Applications

• Semiconductor Integrated Circuits:Widely used in VLSI (Very Large Scale Integration) manufacturing.
• Optical Discs and Displays:Utilized in surface coatings for flat-panel displays and optical discs.
• Craft Products:Important applications in shipbuilding, petrochemicals, electrical appliances, instruments, medical machinery, and consumer goods.

The copper-manganese target is a high-purity metallic target used for magnetron sputtering. Made from high-purity copper and manganese, it plays a crucial role in semiconductor manufacturing. It is essential in the preparation of metal interconnect layers, metal contact layers, and diffusion barrier layers in integrated circuits.

Key Features

• High Purity:With 3N (99.9%) purity, this target ensures excellent performance and reliability during the coating process.
• Variety of Shapes:Available in block, sheet, and custom shapes to accommodate different equipment and process requirements.
• Stability:Exhibits excellent physical and chemical stability, making it suitable for demanding industrial environments.

Applications

• Semiconductor Manufacturing:Widely used in the preparation of metal interconnects, contact layers, and diffusion barriers in integrated circuits, ensuring circuit performance and stability.
• Optoelectronic Devices:Enhances the conductivity and overall performance of optoelectronic components during manufacturing.
• High-Performance Films:Suitable for producing high-performance film materials used in various electronic devices and functional coatings.

The Copper-Gallium alloy target is a crucial material for the production of CIGS thin-film solar cells, serving as a key component of the light-absorbing layer. This target is produced through specialized processes that ensure high purity and uniform microstructure, available in both flat and rotating forms to meet various production needs.

Key Features

• High Purity and Density:Offers high purity (4N to 5N) with a uniform structure that supports high conversion efficiency.
• Excellent Microstructure:Average particle size is less than 300 μm, ensuring stability and uniformity during the sputtering process.
• Diverse Forms:Available as both flat and rotating targets, suitable for different production requirements and application environments.

Applications

• CIGS Thin-Film Solar Cells:Essential material for the light-absorbing layer in CIGS solar cells, enhancing the photoelectric conversion efficiency and stability of the batteries.
• Photovoltaic Sector:The outstanding physical properties of the Copper-Gallium target make it widely used in the production of new thin-film photovoltaic cells, positioning it as an important material for future efficient and low-cost solar cells.

Features:

· Physical Properties: Silver-gray metallic blocks with high hardness and strength, capable of withstanding mechanical stress, offering an advantageous strength-to-weight ratio.

· Chemical Properties: Excellent corrosion resistance, stable in most environments, and has good oxidation resistance at high temperatures.

· Magnetic Properties: Exhibits certain magnetic properties, making it useful for the production of magnetic materials.

Manufacturing Methods:

· Powder Metallurgy: Iron and titanium powders are mixed in proportion, then pressed and sintered to form the target, ensuring controlled composition and high density.

· Vacuum Melting: Iron and titanium are melted in a vacuum environment to reduce impurities and enhance purity.

· Sputtering: High-energy particles bombard the target to form thin films, resulting in high-quality coatings.

Applications:

· Electronics Industry: Used in thin film deposition for semiconductor manufacturing, including magnetic storage media and conductive films.

· Aerospace Sector: Due to its high strength, lightweight nature, and corrosion resistance, it is suitable for structural components in aircraft and spacecraft.

· Mechanical Manufacturing: Utilized in the production of tools, molds, and other equipment to enhance hardness and wear resistance.