High-purity zirconium sputtering targets are produced using electron beam melting technology, ensuring the same excellent performance as the raw material. These targets, with a silver-gray appearance and a density of 6.49 g/cm³, have a melting point of 1852°C. Zirconium targets are highly corrosion-resistant and exhibit excellent electrical conductivity, making them ideal for use in coating, semiconductor, and optical applications.

Key Features

• High Purity (99.95%): Ensures excellent sputtering performance.
• High Density and Melting Point: Can withstand high-temperature and high-pressure environments.
• Excellent Corrosion Resistance: Ideal for demanding and harsh working conditions.
• Customizable Sizes: Available in various specifications to meet different application requirements.

Applications

Zirconium sputtering targets are widely used in various fields:

• Decorative Coatings: For metallic and ceramic surface coatings.
• Semiconductor Industry: In thin-film deposition processes for semiconductor production.
• Optical Coatings: Used in the coating of optical equipment and lenses.
• High-Temperature Materials: Serves as an alloying agent for high-temperature alloys.
• Anti-Corrosion Coatings: Applied in corrosion-resistant coatings for the chemical industry.
• Emulsifiers: Used as emulsifiers in chemical applications.