High purity niobium targets are made from 99.95% pure niobium metal, refined using a vacuum electron beam (EB) melting process to ensure high-quality material. Niobium targets are silver-gray in color, exhibiting excellent physical properties such as a high melting point (2477°C) and low density (8.57g/cm³). The targets are produced with advanced rolling techniques and precise annealing temperature control, ensuring grain size between 30-80 microns and surface roughness less than Ra 0.4μm, providing stable and uniform performance in thin film deposition.

Features

• High Purity (99.95%):Ensures material stability and superior electrical properties.
• Precision Processing:Grain size and surface flatness meet strict standards for consistent performance.
• Customizable Sizes:Can be tailored to meet specific application needs.
• Excellent High-Temperature Performance:Suitable for high-temperature working environments.
• Good Chemical Stability:Ideal for thin film deposition in various corrosive environments.

Applications

• Electronic Displays:Used in thin film deposition for TFT, LCD, flat panel displays, touch screens, and other display technologies.
• Optical Coatings:Applied in thin film deposition for optical lenses, glass coatings, and other optical devices.
• Solar and Renewable Energy:Used in electrode films for solar cells, energy surface coatings, and other renewable energy applications.
• Information Storage:Employed in surface coatings for high-end information storage devices.
• Corrosive Chemical Environments:Provides stable thin film protection in corrosive environments.
• Aerospace and Marine:Applied in surface coatings for aerospace equipment and the maritime industry to enhance durability.