High Purity Silicon Target

Product Overview

High purity silicon targets are made from 5N-grade silicon materials through precision processing techniques. These targets have a deep gray appearance and exhibit high thermal conductivity and excellent physical properties. Silicon has a melting point of 1414°C and a boiling point of 3265°C, offering excellent high-temperature resistance and a high thermal conductivity coefficient. These properties make high purity silicon targets highly effective for use in microelectronics, optics, and thin-film deposition, especially in reactive magnetron sputtering techniques to deposit high-quality dielectric layers (such as SiO₂, SiN, etc.).

Key Features

• High Purity: Purity of 99.999%, ensuring superior quality and stability.
• Excellent Thermal Conductivity: With a thermal conductivity of 149 W·m⁻¹·K⁻¹, it is ideal for high-temperature applications.
• Customizable: Can be tailored to different sizes and shapes as per customer requirements.

Applications

• LCD Transparent Conductive Glass: Used to deposit transparent conductive layers for LCD displays.
• Low-E Glass for Buildings: Enhances the thermal insulation performance of glass.
• Microelectronics Industry: Used for the deposition of semiconductor devices and thin-film electronic materials.
• Optical Applications: Widely used for the deposition of optical films, such as coatings for optical devices.
• Magnetron Sputtering: Used in the deposition of dielectric layers like SiO₂ and SiN.