The high-purity germanium target is manufactured from 99.999% pure germanium. It has a gray-white appearance and exhibits the hard and brittle characteristics of a semi-metal. With a density of 5.35 g/cm³ and a melting point of 937°C, it offers excellent stability and adaptability to various deposition processes. Germanium targets are indispensable in the production of optical thin films, especially for infrared and high-performance optical components.

Features

• Ultra-High Purity: Ideal for precise optical and high-tech applications.
• Stable Semiconductor Properties: Reliable performance for demanding environments.
• Industry-Compliant Packaging: Ensures safe handling and transportation according to international standards.

Applications

• Optical Thin Films: Used in the deposition of germanium films for infrared optical components, especially in the 8–14 µm wavelength range.
• Thermal Imaging: Core material for thermal imaging optical elements, including passive thermal imagers, night vision devices, and firefighting thermal detectors.
• Infrared Spectroscopy: Essential for high-sensitivity infrared detectors.
• Precision Optical Equipment: Widely applied in military, mobile night vision, and industrial inspection devices.
• Other Applications: Serves as an additive for specialized alloys and as a chemical catalyst in certain processes.

Product Features

• High Purity:Purity levels of 4N to 5N, tailored for advanced industrial applications.
• Exceptional Performance:Excellent electrical conductivity, moderate melting point, and low density for ease of processing and use.
• Precision Engineering:Manufactured under strict quality control to achieve uniform structure and surface quality.
• Antibacterial Properties:Biocompatible and antibacterial, suitable for medical applications.

Applications

• Semiconductor Manufacturing:Used in the production of metallized and oxide thin films for transistors, solar cells, LEDs, and other electronic components.
• Hard Drive Production:Ideal for coating hard drives and manufacturing magnetic heads, ensuring high purity and superior conductivity.
• Medical Devices:Applied in the fabrication of artificial joints, dental restoration materials, pacemakers, medical leads, and electrodes.
• Thin-Film Coating:Utilized for decorative and antibacterial coatings in medical equipment and large-area coatings for fuel cells.

Features:

• High Purity:Achieving a purity level of 99.99%, ensuring excellent target performance.
• Strong Plasticity:Easily processed into various shapes to meet customer requirements.
• Good Adhesion:Capable of adhering to surfaces such as glass.

Applications:

1. Thin Film Deposition:Widely used in the production of films for electronic products, LEDs, and photovoltaic devices.
2. Optical Coatings:Utilized for functional coatings on automotive and building glass.
3. Electronic Components:Applied in rectifiers, thermistors, and photoconductors.
4. Low Melting Alloys:Can be used to manufacture alloys with high reflectivity, applicable in various electrical components.

High-purity zinc target material is a light gray, lustrous, diamagnetic transition metal primarily used for film deposition and material research. Zinc targets have a relatively low melting point (419.5°C) and boiling point, making them suitable for various industrial applications.

Key Features

• High Purity:Purity reaches 99.99%, ensuring stability and performance of the target material.
• Physical Properties:Exhibits good ductility between 100°C and 150°C but may become brittle at higher temperatures.
• Customizable Specifications:Available in various sizes, customizable according to customer requirements.
• Lustrous Appearance:Light gray with excellent diamagnetic properties.

Applications

1. Film Deposition:Used in the deposition of films for electronic and optoelectronic devices, providing excellent conductivity.
2. Material Research:Widely applied in materials science research to test the properties of metals under various conditions.
3. Zinc Coating Industry:Serves as a raw material for electroplating zinc, enhancing the corrosion resistance of metal surfaces.
4. Alloy Preparation:Used in the manufacturing of various metal alloys to improve material properties.

The high-purity tin target is a silvery metallic sputtering target with 99.9% purity and a low melting point of 231.97°C, offering excellent chemical resistance. Tin targets are widely used in coating and alloy manufacturing. In coating applications, they help prevent corrosion in other metals and are essential in producing tin-coated steel plates. Tin targets are also suitable for producing soft solder alloys and are a critical component in bronze, bearing materials, and low-melting alloys.

Key Features

• High Purity:9% purity, ideal for high-quality sputtering applications.
• Excellent Chemical Resistance:Suitable for anti-corrosion coatings on various metals.
• Customizable Specifications:Sizes can be tailored to customer requirements.

Applications

1. Corrosion-Resistant Coatings:Used as a coating to prevent corrosion of other metals, commonly in tin-coated steel production.
2. Alloy Manufacturing:Used in producing soft solder, bronze, and other specialty alloys.
3. Electronic and Electrical Applications:Serves as an alloy element in soft solder production.
4. Research and Development:Suitable for sputtering and thin-film applications in laboratory and high-end research environments.

Key Features

• High Melting Point: Tungsten’s exceptionally high melting point allows it to withstand high-temperature environments, making it ideal for high-temperature processes.
• Low Expansion Coefficient: Suitable for applications that require precise control over shape and size.
• Thermal and Chemical Stability: Tungsten targets offer excellent corrosion resistance and oxidation resistance, making them ideal for harsh working conditions.
• Low Vapor Pressure: Tungsten maintains stable physical properties at high temperatures, ideal for high-precision sputtering applications.

Applications
Tungsten targets are widely used in multiple industries, particularly for thin-film deposition:

• Thin-Film Coating: Commonly used in optical coatings, CD-ROM manufacturing, decorative coatings, etc.
• Display Manufacturing: Used for functional layer coatings in flat-panel display production.
• Optical Information Storage: Applied in optical communications and other high-performance optical information storage applications.
• Glass Coatings: Tungsten targets are used in automotive and architectural glass coating to enhance durability and optical performance.
• Optoelectronics: Used in other high-precision devices to improve optical and electronic performance.

Product Features

• High Purity:Copper targets with 4N and higher purity ensure excellent performance and stability
• Excellent Sputtering Performance:Suitable for high-precision vacuum deposition processes
• High Electrical and Thermal Conductivity:Improves performance and efficiency of electronic components
• High-Temperature Resistance:High melting point ensures suitability for high-temperature applications

Applications

• Electronics Industry:Used in integrated circuits, information storage, liquid crystal displays (LCD), laser memory devices, and electronic control components
• Glass Coating Field:Used for vacuum deposition on glass surfaces to improve corrosion resistance and functionality
• Wear-Resistant Materials Industry:Used in high-strength wear-resistant coatings
• High-Temperature Corrosion Applications:Used in manufacturing high-temperature corrosion-resistant materials and high-end decorative items

Features:

• High Purity:Ensures film quality by minimizing impurity effects.
• Excellent Physical Properties:High melting point and moderate density suitable for various industrial applications.
• Customization Options:Targets can be tailored to meet specific customer requirements regarding size and shape.

Applications:

Magnetron Sputtering:

• Used in the production of high-performance thin films, including permanent and soft magnetic materials.

Functional Material Films:

• Suitable for the fabrication of electronic devices and optoelectronic materials.

High-End Electronic Components:

• Applied in premium electronic and optoelectronic devices to enhance performance.

Features

• Excellent Electrical Conductivity and Thermal Stability: Tantalum targets have outstanding electrical conductivity and resistance to high temperatures, making them suitable for use in extreme conditions.
• High Density and Ductility: The high density of tantalum ensures excellent mechanical properties, and it maintains stability under high-temperature conditions.
• Versatile Shapes: Available in flat, rotating, and custom shapes to meet specific application needs.
• Precision Manufacturing: Advanced electron beam melting technology ensures the high purity and uniformity of the target material.

Applications
High purity tantalum targets are extensively used in the following industries:

• Electronics: Tantalum targets are widely used in capacitor production, especially in high-end applications such as telecommunications, data storage, and medical devices.
• Semiconductor Industry: Used in Physical Vapor Deposition (PVD) processes to deposit thin films on semiconductor substrates, forming diffusion barriers for copper interconnects.
• Aerospace: In aerospace applications, tantalum targets are used for producing high-temperature alloys, such as those used in turbine blades, due to their excellent heat resistance and corrosion resistance.
• Chemical Processing: Tantalum’s corrosion resistance makes it an ideal material for equipment in the chemical and pharmaceutical industries, often used in manufacturing containers, pipes, valves, and heat exchanger linings.
• Optics and Thin Film Technology: Tantalum targets are commonly used in optical coating, flat-panel displays, and functional material thin films.

Key Features

· High Purity: Available in 4N and 4N5 purity, ensuring excellent performance and stability.

· Excellent Corrosion Resistance: Titanium’s exceptional corrosion resistance allows it to maintain excellent performance in a wide range of harsh environments.

· High Strength and Lightweight: Titanium’s combination of strength and light weight makes it ideal for aerospace, medical, and decorative applications.

· Biocompatibility: Due to its biocompatibility, titanium is widely used in medical devices and implants.

· Variety of Shapes: Titanium sputtering targets are available in flat, rotary, and custom-shaped forms to suit different application requirements.

Applications
Titanium sputtering targets are used across various industries, especially in coating, semiconductor, and optical fields. The target is primarily used for evaporation in a vacuum and deposition as a coating, commonly applied in wear protection, decorative coatings, and high-precision semiconductor and optical coatings. Due to its excellent biocompatibility, titanium is also widely used in surgical tools and implants. Additionally, titanium sputtering targets find significant applications in aerospace and high-end jewelry design.