new material
Titanium disilicide is a high-purity intermetallic compound recognized for its excellent electrical conductivity, thermal stability, and oxidation resistance. It is widely used in semiconductor manufacturing, thin-film coatings, microelectronics, and aerospace applications. With superior durability and efficiency, titanium disilicide plays a crucial role in advanced materials engineering, energy conversion systems, and precision electronic components.
Product Overview:
Titanium disilicide (TiSi2) is a black powder with a high melting point (2130°C) and a density of 4.10 g/cm³. It has stable chemical properties and is commonly used in high-temperature and high-performance applications. Due to its low thin-film resistivity and strong chemical stability, titanium disilicide holds significant potential in the fields of microelectronics and aerospace.
Product Features:
- Low Resistivity:Excellent performance in the microelectronics industry, ideal for manufacturing thin-film resistors.
- High Melting Point:Melting point up to 2130°C, suitable for high-temperature environments.
- Strong Chemical Stability:Maintains excellent chemical stability in harsh environments.
Applications:
- Microelectronics:Widely used in microelectronic devices and thin-film resistor manufacturing.
- Aerospace and Aviation:Utilized in the manufacture of spacecraft and aircraft components.
- Marine and Submarine Industries:Employed as a high-performance material in ship and submarine manufacturing.
- Medical Field:Used in the production of medical instruments and implants.
- Jewelry Manufacturing:Serves as a unique material in the creation of high-end jewelry.
