Tantalum Nitride (TaN) is a high-performance inorganic compound known for its exceptional hardness, excellent wear resistance, and superior corrosion resistance. This compound is primarily used in specialized applications such as thin film resistors, barrier layers in microelectronics, and hard coatings, where it serves in critical components exposed to demanding environments. Its unique chemical composition and properties make it suitable for applications requiring reliability and high performance.
Product Overview
Tantalum nitride (TaN) is a material with excellent physical, chemical, and mechanical properties, featuring a high melting point of 3090°C and a density of 14.3 g/cm³. It exhibits outstanding wear resistance, thermal stability, and chemical inertness, making it ideal for applications in extreme conditions. TaN's properties make it an essential material for producing high-performance components, coatings, and thin films.
Key Features
- High Melting Point and Density: With an extremely high melting point and density, TaN is suitable for applications in extreme conditions.
- High Hardness and Wear Resistance: Provides high hardness and excellent wear resistance, ideal for high-load environments.
- Chemical Inertness: Insoluble in water and acids, offering excellent corrosion resistance for use in harsh environments.
- Thermal Stability: Maintains stability at high temperatures, offering excellent heat resistance.
- Low Temperature Coefficient of Resistance: Good conductivity, making it suitable for electrical and electronic components.
Applications
- Resistors, Capacitors, and Inductors: Used in the manufacture of these electronic components, providing high electrical stability and durability.
- Semiconductor Devices: Widely used in the semiconductor industry for diffusion barriers in integrated circuits and in the production of high-performance thin-film resistors.
- Wear-Resistant Coatings: Applied in coating technologies to enhance the wear resistance of components.
- Thin-Film Resistors: Due to its excellent thermal stability and conductivity, TaN is commonly used in the production of high-precision resistors for thin-film resistor applications.
Item | Description |
Molecular Formula | TaN |
CAS Number | 12033-62-4 |
Molecular Weight | 194.95 |
Appearance | Black powder |
Density | 14.3 g/cm³ |
Melting Point | 3090℃ |