MOCVD Graphite Large Disk
MOCVD Graphite Large Disk
MOCVD Graphite Large Disk
MOCVD Graphite Large Disk

MOCVD Graphite Large Disk

  • element:Graphite
  • purity:High Purity
  • shape:Disc
  • specification:φ610×H28 mm
  • packaging:Customizable based on customer needs

MOCVD graphite large disk is a high-precision carbon component engineered for advanced semiconductor and optoelectronic manufacturing. Designed for metal-organic chemical vapor deposition (MOCVD) processes, this graphite disk exhibits superior thermal stability, optimized structural integrity, and exceptional chemical resistance. Its high-purity composition ensures uniform heat distribution, minimal contamination, and long-term operational reliability in extreme environments, making it ideal for epitaxial wafer growth and thin-film deposition.

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Product Overview
The MOCVD graphite large disk is a crucial component in the Metal Organic Chemical Vapor Deposition (MOCVD) process, primarily designed to enhance the light reflection within the reactor. With precision machining and uniform coating treatment, this large disk effectively increases the light intensity inside the reactor, optimizing the uniformity and efficiency of the deposition process. It is suitable for industries such as semiconductors, LEDs, and optoelectronics, meeting the high demands of precision manufacturing for light and temperature uniformity.

Key Features

  • Excellent Light Reflection Performance: Through optimized design and material selection, it provides outstanding light reflection, increasing light intensity inside the reactor and ensuring uniform deposition.
  • Good High-Temperature Resistance: Designed to withstand the high temperatures generated during the MOCVD process, ensuring stable performance under extreme conditions.
  • Uniform Coating: The uniform coating thickness enhances corrosion resistance, improving the thermal stability and extending the material's lifespan.
  • High Purity Graphite Material: Made from high purity graphite, ensuring long-term stability and reliability in extreme environments.

Applications

  • Semiconductor Manufacturing: Used in MOCVD reactors in the semiconductor industry to optimize reflection and ensure uniform deposition.
  • LED Manufacturing: Enhances the reflection effect in LED production, increasing light intensity and improving product quality.
  • Optoelectronics: Suitable for the production of optoelectronic components, optimizing light reflection and temperature uniformity.
  • Precision Manufacturing: Ensures effective light and temperature control in high-precision and high-efficiency manufacturing processes.

 

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