Hard Composite Felt for Semiconductor Industry
Hard Composite Felt for Semiconductor Industry
Hard Composite Felt for Semiconductor Industry
Hard Composite Felt for Semiconductor Industry

Hard Composite Felt for Semiconductor Industry

  • element:Carbon
  • purity:High Purity (Low Ash Content)
  • shape:Felt (Customizable)
  • specification:Customizable based on customer needs
  • packaging:Customizable based on customer needs

Hard composite felt for the semiconductor industry is an advanced carbon-based material engineered for extreme thermal resistance, structural durability, and precision filtration. Manufactured using high-performance carbon fibers and controlled processing techniques, this felt provides superior insulation, low thermal conductivity, and enhanced stability under high temperatures. It is widely used in semiconductor wafer processing, high-purity gas filtration, vacuum furnace insulation, and advanced electronics manufacturing, ensuring reliable performance in demanding industrial environments.

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Product Overview
Hard composite felt for the semiconductor industry is a specialized thermal field material designed to meet the high purity requirements of semiconductor crystal growth processes. This product features low ash content and high resistivity, ensuring stability and purity in high-temperature environments, particularly in the high-temperature thermal fields used during crystal growth. With its excellent insulation and resistivity properties, it is widely used in semiconductor manufacturing processes that require extremely high purity.

Key Features

  • Low Ash Content: Extremely low ash content ensures that no impurities are introduced during the semiconductor crystal growth process.
  • High Resistivity: High resistivity ensures that the material can effectively isolate current in high-temperature environments, preventing unnecessary electrical conduction.
  • High Purity: The material's high purity meets the stringent purity requirements of semiconductor applications.
  • Good Thermal Stability: Stable and reliable performance in high-temperature environments, ensuring long-term usability.
  • Excellent Insulation Performance: Provides outstanding thermal isolation, reducing heat loss and maintaining thermal field balance.

Applications

  • Semiconductor Crystal Growth: Widely used in high-temperature thermal fields during semiconductor crystal growth, ensuring purity and stability throughout the growth process.
  • High-Purity Semiconductor Manufacturing: Ideal for semiconductor manufacturing environments that require materials with extremely high purity and low ash content.
  • High-Temperature Heat Treatment: Used for thermal field management during high-temperature heat treatment, smelting, and other processes, providing effective insulation and heat isolation.
  • Electronic Materials Processing: Suitable for processing environments that demand high purity, ensuring high-quality outputs during the fabrication of electronic materials.
ItemTechnical Index
Thermal Conductivity (1150°C) (W/m·k)<0.25
Density (g/cm³)0.13-0.18
Ash Content (ppm)<20, or <5

 

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