new material
Hafnium disilicide is a high-purity intermetallic compound known for its exceptional thermal stability, electrical conductivity, and oxidation resistance. It is widely used in high-temperature coatings, semiconductor applications, aerospace components, and advanced electronic materials. Due to its superior durability and efficiency in extreme environments, hafnium disilicide plays a crucial role in precision manufacturing, scientific research, and specialized engineering.
Product Overview:
Hafnium disilicide (HfSi₂) is a fine chemical material with outstanding physical and chemical properties, making it ideal for high-temperature and high-resistance applications. This product is primarily used in the semiconductor industry and as a material for fine ceramics.
Product Features:
- High Purity:With a purity of 99.9%, it ensures excellent material performance.
- High-Temperature Stability:Hafnium disilicide has a high melting point, making it suitable for use in high-temperature environments.
- Excellent Electrical Resistance:It is well-suited for thin-film applications requiring high resistance.
Applications:
- Fine Ceramic Materials:Used in the production of fine ceramics, offering excellent high-temperature resistance.
- Semiconductor Thin Film Production:Commonly applied as crucible material in semiconductor thin film manufacturing processes.
