Hafnium Dioxide (HfO2)

Product Overview
Hafnium dioxide (HfO2) is a colorless solid and one of the most common and stable compounds of hafnium. It has a high bandgap (5.3–5.7 eV), making it an excellent electrical insulator. Due to its outstanding chemical stability and high melting point, HfO2 is widely used in various technological fields, including optics, electronics, and high-temperature applications.

Product Features

• High Chemical Inertness:HfO2 does not react with water, hydrochloric acid, or nitric acid but can react with concentrated sulfuric acid and hydrofluoric acid.
• High Melting Point:It has an extremely high melting point and demonstrates excellent heat resistance at high temperatures.
• Electrical Insulating Properties:As an electrical insulator, HfO2 provides good electrical performance in many electronic and optical applications.
• Wide Bandgap:With a bandgap of 5.3–5.7 eV, HfO2 is suitable for high-frequency and high-temperature applications.

Applications

• UV Protection and Interference Films:Used in optical applications such as UV protection films and interference coatings, offering strong UV protection and efficient optical performance.
• Optical Coatings and Electronic Devices:Applied in optical coatings, DRAM capacitors, and advanced metal-oxide semiconductor devices as a high-k dielectric.
• Thermocouples and Refractory Materials:Due to its high melting point, it is widely used in thermocouples and other high-temperature insulation refractory materials.
• Building Passive Cooling:Multi-layer thin films made with materials like silica are used in passive cooling systems for buildings.
• Electronics Industry:In the electronics industry, HfO2 is a crucial material used in a variety of electronic components.