new material
Excimer lithography grade calcium fluoride (CaF₂) is a high-purity optical material designed for advanced photolithography applications requiring superior ultraviolet transmission, minimal optical distortion, and exceptional structural integrity. Engineered for extreme precision, it offers outstanding resistance to radiation damage, low birefringence, and optimized refractive index control. This specialized CaF₂ variant is widely used in semiconductor fabrication, laser optics, and scientific research, ensuring optimal performance in high-resolution imaging and precision optical systems.
Product Overview:
Excimer Lithography Grade Calcium Fluoride is a premium optical material widely used in optical instruments, laser technologies, optical communication, and photolithography. It boasts extremely high transparency, excellent refractive properties, and chemical stability, making it particularly well-suited for the manufacture of precision optical components. The unique optical characteristics of calcium fluoride give it an irreplaceable advantage in high-precision applications such as excimer laser lithography, significantly enhancing the stability and imaging quality of optical systems.
Key Features:
- High Transparency and Low Scattering:Offers extremely high transmission, especially in the ultraviolet and visible light ranges. The low scattering ensures excellent imaging quality.
- Exceptional Optical Properties:Features a high refractive index, enhancing visible light transmission across a wide wavelength range, improving optical system stability and accuracy.
- UV Resistance:Stable performance in the ultraviolet spectrum, making it ideal for use in photolithography systems.
- High Purity and Stability:With carefully controlled purity and stability, it meets the high-performance demands of optical systems.
- Precise Wavelength Alignment:It offers highly accurate visible light wavelength positioning with an error margin of approximately ±0.2nm, ensuring high-precision optical applications.
Applications:
- Excimer Laser Lithography:Used in photolithography equipment for semiconductor manufacturing, ensuring high-precision imaging during the photolithography process.
- Optical Instruments:Used to manufacture precision optical lenses, prisms, and windows, improving the performance of optical systems.
- Laser Technology:Used as an optical element in laser systems to ensure efficient beam transmission and stability.
- Optical Communication:Provides high-efficiency light transmission in optical communication systems, ensuring signal stability and quality.
- High-Precision Microscopes and Telescopes:Used to manufacture high-precision optical components, enhancing the imaging quality and accuracy of microscopes and telescopes.
| Optical Property | Value |
| Transmission Range | 0.13-10 μm |
| Transmittance | >94%@193nm-7.87μm |
| Refractive Index | 1.4288@2.5μm, 1.39908@5μm |
| Reflection Loss | 5.4%@5μm (both surfaces) |
| Absorption Coefficient | 7.8×10⁻⁴@2.7μm |
| Structure | Cubic Crystal System |
| Cleavage Planes | <111 |
| Physical Property | Value |
| Density | 3.18 g/cm³ |
| Melting Point | 1420 ℃ |
| Thermal Conductivity | 9.71 W/(m·K) @ 293K |
| Thermal Expansion | 18.5×10⁻⁶/K @ 273K |
| Knoop Hardness | 158.3 kg/mm² |
| Specific Heat Capacity | 854 J/(kg·K) |
| Dielectric Constant | 6.76 @ 1 MHz |
| Young's Modulus | 75.8 GPa |
| Shear Modulus | 33.77 GPa |
| Bulk Modulus | 82.71 GPa |
| Poisson's Coefficient | 0.26 |
| Chemical Property | Value |
| Solubility | 0.016 g/L @ 20℃ |
| Molecular Weight | 78.0748 g/mol |
| Property | Value |
| Material Name | Excimer Laser Grade CaF₂ |
| Available Size | 3-200mm |
| Material Grade | VUV |
| Application Wavelength | 193nm, 248nm |
| Internal Transmittance | >99.8% |
| Refractive Index Homogeneity | 1~15 |
| Stress Birefringence | 1~20 |
| Crystal Structure | Monocrystalline |
| Blank Shape | Round, rectangular, wedge, lens, step drilled, special-shaped |
